发明名称 |
Magnet array in conjunction with rotating magnetron for plasma sputtering |
摘要 |
An array of auxiliary magnets positioned along sidewalls of a magnetron sputter reactor on a side towards the wafer from the target. The magnetron preferably is a small, strong one having a stronger outer pole of a first magnetic polarity surrounding a weaker outer pole of a second magnetic polarity and rotates about the central axis of the chamber. The auxiliary magnets preferably have the first magnetic polarity to draw the unbalanced magnetic field component toward the wafer. The auxiliary magnets may be either permanent magnets or electromagnets.
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申请公布号 |
US2003089601(A1) |
申请公布日期 |
2003.05.15 |
申请号 |
US20010993543 |
申请日期 |
2001.11.14 |
申请人 |
DING PEIJUN;TAO RONG;XU ZHENG |
发明人 |
DING PEIJUN;TAO RONG;XU ZHENG |
分类号 |
H05H1/46;C23C14/04;C23C14/34;C23C14/35;H01J37/32;H01J37/34;H01L21/285;H01L21/768;(IPC1-7):C23C14/35 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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