SUBSTRATE TREATMENT APPARATUS

摘要

PROBLEM TO BE SOLVED: To stably maintain high cleanliness within a cabinet in a substrate treatment apparatus for manufacturing a semiconductor device by conducting processes such as film forming and impurity diffusion or the like to the substrate. SOLUTION: This substrate treatment apparatus is provided with individual air supply ports 21, 22 for a plurality of independent clean air flows formed so as to make well balanced clean air flow to each unit of a down-cooling unit 9, buffer cooling unit 11 and side cooling unit 12 mounted in a cabinet 1.