| 摘要 |
PROBLEM TO BE SOLVED: To provide a light source for an exposure apparatus which can reduce a user's burden, suppress power consumption, expose a substrate with a beam having a stable quantity of light at any time immediately, and detect changes in the quantity of light in real time during the exposure of the substrate. SOLUTION: The light source system for the exposure apparatus which exposes a circuit pattern scribed on a mask onto an exposure surface of the substrate comprises: a light emitting means having a plurality of light emitting elements which are arrayed discretely in two dimensions for emitting a light flux for exposing substantially the whole area of an exposure stage without leaving a gap by scanning in a first direction; a light receiving means; a light guide means disposed between the light emitting means and a mask hold position for guiding a portion of each flux of light emitted from the light emitting means to the light receiving means; and a detection means for detecting the quantity of light received by the light receiving means. COPYRIGHT: (C)2003,JPO
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