发明名称 Compound semiconductor device with depletion layer stop region
摘要 The conventional compound semiconductor switching device is prone to have a large chip size as the gate width needs to be large for achieving a low insertion loss and the separation between the connecting pad and the circuit wiring needs to be larger than 20 mum for obtaining a proper isolation between them. The overall chip size is reduced, first, by reducing the gate width of the switching FET operating at frequencies above 2.4 GHz to 700 mum or smaller together with the omission of the shunt FET, and, then, by reducing the separation between the connecting pad and the circuit wiring to 20 mum or smaller. This reduction of the separation is made possible by the introduction of an insulating film and a impurity region between the outermost portion of the connecting pad and the substrate for preventing the extension of the depletion layer. The manufacturing method of this device does not need any additional processing step for accommodating the above structure, and is capable of producing a device having a size of one fifth of the conventional device.
申请公布号 US6580107(B2) 申请公布日期 2003.06.17
申请号 US20010973197 申请日期 2001.10.10
申请人 SANYO ELECTRIC CO., LTD. 发明人 ASANO TETSURO;HIRAI TOSHIKAZU;HIGASHINO TAKAYOSHI;HIRATA KOICHI;SAKAKIBARA MIKITO
分类号 H01L21/8252;H01L27/06;(IPC1-7):H01L29/80;H01L31/112 主分类号 H01L21/8252
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