发明名称 HOME BATH FOR PHOTORESIST NOZZLE
摘要 PURPOSE: A home bath for a photoresist nozzle is provided to prevent the position of the photoresist nozzle from varying and prevent a nozzle tip from being damaged by performing a dummy dispense process without movement of the photoresist nozzle in a home bath position and by fabricating a sealing structure in which a nozzle head corresponds to the hole of the home bath. CONSTITUTION: An inclined surface(40,44) having a predetermined tilt angle makes the thinner component received in the home bath(12) leak out to the atmosphere when a photoresist nozzle head is settled, formed in the vicinity of the hole(20) formed in the upper surface of the home bath. The bottom of the home bath is an inclined surface. A drain member(46) is connected to the lowermost portion of the inclined surface.
申请公布号 KR20030053333(A) 申请公布日期 2003.06.28
申请号 KR20010083512 申请日期 2001.12.22
申请人 DONGBU ELECTRONICS CO., LTD. 发明人 KWON, SUN HO;PARK, JONG WON
分类号 H01L21/02;(IPC1-7):H01L21/02 主分类号 H01L21/02
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