发明名称 |
SUBSTRATE FOR GROWING EPITAXIAL FILM AND LAYERS OF GALLIUM NITRIDE |
摘要 |
FIELD: electronic engineering; manufacture of information representation and processing units. SUBSTANCE: substrate is made from monosilicides of transition metals of period IV and solid solutions on their base for growth of epitaxial layers of gallium nitrides. Proposed materials ensure growth of large and perfect crystals at moderate temperatures and proper alignment of their lattices. EFFECT: improved quality of crystals.
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申请公布号 |
RU2209861(C2) |
申请公布日期 |
2003.08.10 |
申请号 |
RU20010115887 |
申请日期 |
2001.06.15 |
申请人 |
AJTKHOZHIN SABIR ABENOVICH |
发明人 |
AJTKHOZHIN S.A. |
分类号 |
C30B19/12;C30B15/00;C30B25/18;C30B29/10;C30B29/38;(IPC1-7):C30B19/12 |
主分类号 |
C30B19/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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