| 摘要 |
PROBLEM TO BE SOLVED: To supply a material stably at the time of film deposition and to obtain a high purity copper thin film exhibiting excellent thermal stability in which the lifetime is prolonged by retarding decomposition under preservation state, and to obtain an MOCVD process in which an MOCVD system is not corroded easily, treatment of exhaust gas is not complicated and adhesion to an underlying film is enhanced. SOLUTION: In the solution material for metal-organic CVD produced by dissolvingβ-diketonate complex of copper (II) in an organic solvent, the organic solvent is one kind or more than one kind of compound selected from a group of n-methyl-2-pyrrolidone, dimethylaniline, di-t-butylaniline, di-n-butylaniline, diisopropylaniline, tri-t-butylaniline, and triisopropylaniline. COPYRIGHT: (C)2003,JPO
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