MECHANICALLY AND THERMODYNAMICALLY STABLE AMORPHOUS CARBON LAYERS FOR TEMPERATURE-SENSITIVE SURFACES

摘要

The invention relates to a method for depositing mechanically and thermodynamically stable amorphous carbon layers using a low-pressure plasma deposition method, especially a PE-CVD or combined PVD-/PE-CVD method. According to the invention, the average kinetic energy per deposited carbon atom is lower than 20 eV, preferably lower than 10 eV and the ionic current density j is smaller than 0.2 mA/cm<2>, preferably smaller than 0.1 mA/cm<2>.