| 摘要 |
PURPOSE: To provide a treatment apparatus for wet-treating a semiconductor wafer, a glass substrate for producing a flat panel display such as a liquid crystal display and a plasma display, and a sheet-like substrate such as a printed circuit board and a substrate washing apparatus by high-pressure fluid discharge which prevents the re-adhesion of particles etc. CONSTITUTION: A washing container has a double box structure of a first container 3 for washing by discharging washing fluids 11 and 12 at a high pressure and a second container 4 on the outside of the first container 3. In the opening parts 3a and 3b of the first container 3 hitting the conveyance route of the substrate W, pure water is discharged by a pipe shower 7 toward a gap formed between it and the substrate W to form a water seal 13 in the gap to control the leakage of the washing fluids 11 and 12. Since the atmosphere of the washing fluids 11 and 12, even when leaked from the first container 3, is discharged in the second container, particles etc., contained in the atmosphere are prevented from adhering again to the substrate etc.
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