发明名称 |
Substrate processing apparatus |
摘要 |
A developer is supplied onto a substrate and thereafter a rinse discharge nozzle is moved toward an operating direction. The rinse discharge nozzle is so moved on the substrate as to continuously supply pure water onto the substrate from a slit discharge port of the rinse discharge nozzle while sucking and recovering the pure water from the surface of the substrate through a slit suction port, and a series of development is performed in a stationary state of the substrate.
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申请公布号 |
US6692165(B2) |
申请公布日期 |
2004.02.17 |
申请号 |
US20020090099 |
申请日期 |
2002.02.28 |
申请人 |
DAINIPPON SCREEN MFG. CO., LTD. |
发明人 |
TANAKA AKIKO;SANADA MASAKAZU;TAMADA OSAMU;HARUMOTO MASAHIKO;NAKANO KAYOKO |
分类号 |
G03F7/30;H01L21/00;(IPC1-7):G03D5/00 |
主分类号 |
G03F7/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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