发明名称 SUBSTRATE TREATMENT EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide substrate treatment equipment which is superior in cost and performance contributing to size reduction. SOLUTION: In this substrate treatment equipment, a substrate W is cleaned while being transferred in a state that the substrate W is tilted in the y direction. All discharge sections positioned in a given carrying section F are tilted in a carrying direction A at a tilted angleα2 which is almost the same angle as tilted angles of air flow formation sections 33, 34. Since the discharged sections 35, 36 are arranged being tilted in the z direction in a state that these are arranged being tilted in the carrying direction A, the discharged direction of pure water from the discharge sections 35, 36 is set so that the discharged direction directs to the upstream in the carrying direction A of the substrate W and to the lower side of the tilted direction while crossing obliquely with the carrying direction A viewing from above, and simultaneously so that the discharged direction of the pure water is tilted in the z direction viewing from the y direction. Hereby, on the substrate W, a water flow which obliquely flows from an upper side in the tilted direction at the end of the downstream of the substrate W in the carrying direction A to a lower side in the tilted direction at the end of an upstream in the carrying direction A, is formed. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004095926(A) 申请公布日期 2004.03.25
申请号 JP20020256402 申请日期 2002.09.02
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 YOSHITANI MITSUAKI
分类号 G03F7/30;B05B13/02;B05B15/04;B05B15/12;H01L21/027;H01L21/304;H01L21/306;H01L21/677;H01L21/68;(IPC1-7):H01L21/304 主分类号 G03F7/30
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