发明名称 METHOD FOR MANUFACTURING THICK FILM MULTILAYER SUBSTRATE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a thick film multilayer substrate manufacturing method capable of reducing the aperture size of a via hole without increasing manufacturing costs. <P>SOLUTION: An unburned thick film insulator sheet (raw sheet) 54 on which a conductive printing layer 84 is formed and conductive paste is applied to the insides of via holes 28, 30 is laminated on a substrate 12, bonded by thermocompression bonding and then burned. However, the via holes 28, 30 formed by punching work can be reduced at its aperture size because the area of the aperture is not reduced in printing. Since the raw sheet 54 is bonded by thermocompression in the case of burning, contraction of the raw sheet 54 in the surface direction can be interrupted by the substrate 12. Consequently, positional deviations of wiring patterns 46, 40, via holes 28, 30, etc. due to large contraction in the face direction can be prevented without adding a specific process, so that mutual intervals between respective parts can be shortened. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2004095676(A) 申请公布日期 2004.03.25
申请号 JP20020251817 申请日期 2002.08.29
申请人 NORITAKE CO LTD 发明人 ISOBE TAKAMASA
分类号 H05K3/46;(IPC1-7):H05K3/46 主分类号 H05K3/46
代理机构 代理人
主权项
地址