发明名称 DEVICE AND METHOD FOR HOLDING SUBSTRATE AND DEVICE AND METHOD FOR TREATING SUBSTRATE USING THEM
摘要 PROBLEM TO BE SOLVED: To change the pinched position of a substrate while the substrate is rotated. SOLUTION: A spin chuck 1 rotates around a rotating shaft 25 while the chuck 1 pinches a wafer W by means of a pinching member F1. In the spin base 21 of the chuck 1, an operation converting mechanism FT1 which converts the operation of an elevating/lowering member 46 into the operation of the pinching member F1 is provided. When a motor M1 is driven, a ball-screw mechanism 61 is driven through gears 54 and 66 and a ball nut 64 is moved vertically. The driving force caused by the vertical movement of the nut 64 is transmitted to the elevating/lowering member 46 through a nonrotating-side mobile member 68, a bearing 71, and a rotating-side mobile member 81. Therefore, the pinched state of the wafer W can be relieved or canceled by operating the pinching member F1 even in the course of rotating the spin chuck 1. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004111903(A) 申请公布日期 2004.04.08
申请号 JP20030083696 申请日期 2003.03.25
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 NIIHARA KAORU;KIMURA MASAHARU;HARA TAKASHI
分类号 H01L21/683;H01L21/306;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/683
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