| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a vacuum treatment device capable of preventing a substrate carrier in an unload chamber from adsorbing impure gas. <P>SOLUTION: This vacuum treatment device uses substrate carriers 1C, 1D moving between a treatment chamber under vacuum atmosphere and an unload chamber 20 repeating vacuum and atmospheric pressure and carrying a substrate G. An infrared lamp unit 90 heating substrate carriers 1C, 1D is installed in the unload chamber 20. <P>COPYRIGHT: (C)2004,JPO</p> |
