| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processing method and apparatus whereby cleaning is performed dependent on the degree of pollution, and to provide a program and data storing medium. SOLUTION: The plasma processing method includes a step (S1) where a workpiece is mounted on a mounting electrode for plasma processing in a plasma processing chamber; a step where the self-bias voltage of the mounting electrode is detected; a step (S2) where a decision is made whether or not to perform cleaning, based on the detected self-bias voltage and on the criterion on deciding whether cleaning is to be performed; and a step (S4) where, when decision is made to perform cleaning, cleaning is performed in compliance with a recipe for cleaning the plasma processing chamber. COPYRIGHT: (C)2004,JPO
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