发明名称 PLASMA POLYMERIZATION SYSTEM
摘要 PURPOSE: A plasma polymerization system is provided to enhance the productivity of samples by installing plural gas supply units at plural deposition chambers and arranging plural gas shroudings at one or more connection paths of the deposition chambers to prevent a mixing phenomenon of different kinds of gases. CONSTITUTION: A plasma polymerization system includes a plurality of deposition chambers(50,60), a plurality of gas supply units(52,62), and a plurality of gas shrouding(70,90). The deposition chambers(50,60) are connected each other to form a double layer on a sample by using plasma. The gas supply units(52,62) supply gases to the deposition chambers, respectively. The gas shroudings(70,90) are arranged at one or more connection paths of the deposition chambers in order to prevent the outflow of gases between the deposition chambers. The gas shrouding include through-holes into which the sample is inserted.
申请公布号 KR20040041206(A) 申请公布日期 2004.05.17
申请号 KR20020069196 申请日期 2002.11.08
申请人 LG ELECTRONICS INC. 发明人 KIM, BYEONG GI
分类号 H05H1/24;(IPC1-7):H05H1/24 主分类号 H05H1/24
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