摘要 |
Systems and methods for providing a frame of an arrow rest are disclosed. Th e arrow rest frame includes first projections and second projections. The frame includes a first surface and a second surface. The first projections, which include a first resistance extend from the second surface. The second projections, which include a second resistance extend from the second surface. The first resistance is greater than the second resistance. The first and second projections define an aperture, wherein an arrow may be radially supported.
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