| 摘要 |
PURPOSE: A lithographic projection apparatus and a device manufacturing method are provided to reduce an error generated during translating substrates in pulses of a radiation system. CONSTITUTION: A lithographic projection apparatus includes a radiation system providing a pulse projection beam of a radiation, a programmable patterner patterning the projection beam according to a desired pattern, a substrate table supporting a substrate, a projection system projecting the patterned beam onto a target portion of the substrate, and a conveyor(S) transferring the substrate with respect to the projection system. The patterned projection beam(2) that is projected onto the substrate during at least one pulse of the radiation system is moved with respect to the projection system so that the projection beam is substantially stationary relative to the substrate during at least one pulse of the radiation system.
|
