发明名称 METHOD FOR FORMING DOT PATTERN
摘要 <p><P>PROBLEM TO BE SOLVED: To form an extremely minute dot pattern with high throughput, at a low cost and with excellent reproducibility in a method for forming a dot pattern. <P>SOLUTION: A plurality of minute probe 1 having a heating mechanism mounted on a probe head are contacted to a substrate 2 on which a thermal deformation material 3 is formed as a film, the probe 1 is heated, recessed patterns 4 losing the thermal deformation material 3 are integrally formed on the substrate 2, then, after embedding a dot forming material 5 in the formed recessed patterns 4, the thermal deformation material 3 is removed. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2004164711(A) 申请公布日期 2004.06.10
申请号 JP20020326647 申请日期 2002.11.11
申请人 FUJITSU LTD 发明人 TEGURI HIRONORI;ABE TAKAYUKI
分类号 G11B5/855;G11B7/26;H01L27/10;H01L27/105;H01L29/06;(IPC1-7):G11B5/855 主分类号 G11B5/855
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