发明名称 SCHOTTKY DIODE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a Schottky diode which is improved in electrical properties by forming a clean Schottky interface where irregularities at atomic level are not present and no crystal defect and no contaminant reside. SOLUTION: The Schottky diode is composed of a semiconductor substrate whose surface is a first crystal orientation plane, and a metallic part that is made of metallic atoms introduced through the surface of the semiconductor substrate to form a Schottky barrier on the second crystal orientation plane of the semiconductor substrate. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004172400(A) 申请公布日期 2004.06.17
申请号 JP20020336910 申请日期 2002.11.20
申请人 FUJITSU LTD 发明人 NAKAMURA SHUNJI;SHITO HIDEJI;UENO TETSUTSUGU
分类号 H01L29/872;H01L29/47;(IPC1-7):H01L29/47 主分类号 H01L29/872
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