| 摘要 |
PROBLEM TO BE SOLVED: To deposit a film on a substrate by efficiently using an evaporating material. SOLUTION: The vapor deposition system is provided with a long line type evaporating source 2, and in which film deposition is performed while relatively moving a glass substrate 1 as the object for vapor deposition and the line type evaporating source 2 along the direction almost vertical to the longitudinal direction thereof. The line type evaporating source 2 is provided with a plurality of holes h through which an evaporating material is emitted, and the cross-section of each hole h has a taper shape. As the taper shape in the cross-section of each hole, the aperture is made wider as it goes to the outlet of the emission of the evaporating material. COPYRIGHT: (C)2004,JPO
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