发明名称 PHOTOSENSITIVE MATERIAL PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive material processing apparatus capable of varying and adjusting a processing time while keeping constant a speed of conveyance for dipping a photosensitive material in a processing liquid. SOLUTION: A conveyance path for photosensitive material which is provided to a conveyance rack 24 arranged in a processing tank 10 in order to dip the photosensitive material 22 in the processing liquid while conveying it is switched by conveyance path switching means 58 and 60 between a long-time processing state in which the path is set long and a short-time processing state in which the path is set short. Development processing conditions for the photosensitive material 22 are made constant by varying only the processing time of the photosensitive material 22. Such trouble that the photosensitive material 22 is tensed or slackened owing to a difference in conveyance speed can be prevented on a conveyance path for passing the photosensitive material 22 to the conveyance rack 24 varying the processing time or a conveyance path for receiving it. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004170520(A) 申请公布日期 2004.06.17
申请号 JP20020333875 申请日期 2002.11.18
申请人 FUJI PHOTO FILM CO LTD 发明人 IWASAKI HIDEO
分类号 G03D3/08;(IPC1-7):G03D3/08 主分类号 G03D3/08
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