PHOTORESIST COATING APPARATUS WITH VIBRATION GENERATOR

摘要

PURPOSE: A photoresist coating apparatus is provided to improve remarkably uniformity of a photoresist layer by using ultrasonic vibrations in a photoresist coating process. CONSTITUTION: A spraying nozzle(12) supplies photoresist(15) on a wafer(13). A wafer chuck(14) for supporting the wafer spins with a desired speed. When the photoresist is supplied on the wafer through the spraying nozzle, an ultrasonic generator(31) as a vibration generator supplies fine vibrations to the wafer chuck.