发明名称 |
ALIGNMENT MARK STRUCTURE WITH SEARCH KEY FOR REGION-IDENTIFICATION |
摘要 |
PURPOSE: An alignment mark structure is provided to find easily an exact position of a search key in a manual search by using an identification mark of the search key. CONSTITUTION: An alignment mark structure is used for alignment in an exposure process. The alignment mark structure is divided into the first and second region(A,B). The first search key(21) is at the boundary of the first region. The second search key(22) is at the boundary of the second region. The Roman alphabet for discriminating between the regions is formed on each search key. The Roman alphabet is used as an identification mark.
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申请公布号 |
KR20040059252(A) |
申请公布日期 |
2004.07.05 |
申请号 |
KR20020085839 |
申请日期 |
2002.12.28 |
申请人 |
DONGBU ELECTRONICS CO., LTD. |
发明人 |
KIM, HYEONG WON |
分类号 |
H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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