| 摘要 |
PURPOSE: An ion beam irradiating apparatus for forming an alignment film is provided to position an ion beam source and a substrate in parallel and draw out the ion beam source with an inclined angle, so that the alignment film has a uniform alignment characteristic. CONSTITUTION: The ion beam irradiating apparatus comprises an ion beam source(400) including a cathode(401), an anode(402), an ion beam drawing out medium(404) and an ion beam accelerating medium(405). A vacuum container(440) irradiates the ion beam(410) to the substrate(420) in a straight line. A holder(421) fixes the substrate(420) in order to maintain the substrate(420) with a constant angle in the vacuum container(440). Gases injected to the ion beam source(400) for generating an ion beam(410) are preferably inert gases such as Ar, Kr and Xe. In order to control the irradiating time of the ion beam(410) to the substrate(420), a shutter is installed between the ion beam source(400) and the substrate(420).
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