发明名称 METHOD OF MANUFACTURING TETRAFLUORO SILANE AND UTILIZATION OF THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a method of efficiently manufacturing high purity tetrafluoro silane. SOLUTION: In the manufacture of tetrafluoro silane by the thermal decomposition reaction of hexafluoro silicate, after a process (1-1) of bringing the hexafluoro silicate into contact with hydrogen fluoride and/or fluorine, a process (2) of producing tetrafluoro silane by the thermal decomposition reaction of the hexafluoro silicate is performed. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004189525(A) 申请公布日期 2004.07.08
申请号 JP20020358169 申请日期 2002.12.10
申请人 SHOWA DENKO KK 发明人 KURIHARA HIDEYUKI;ATOBE HITOSHI;HOSHINO YASUYUKI
分类号 G02B6/00;C01B33/107;H01L21/31;(IPC1-7):C01B33/107 主分类号 G02B6/00
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