发明名称 FILM DEPOSITION APPARATUS, DISPLAY PANEL MANUFACTURING APPARATUS, AND METHOD FOR THE SAME
摘要 PROBLEM TO BE SOLVED: To provide an organic EL display manufacturing device capable of stably controlling the film thickness with excellent responsiveness when an organic layer is deposited by vacuum vapor deposition. SOLUTION: In a state in which a material is scattered from a vapor deposition source 113 to a base material 2 carried by a base material carrying means 111, the vapor deposition velocity is detected based on the film thickness obtained from a film thickness monitor 114, the film thickness vapor-deposited on a substrate is estimated, and a control means 131 controls the material scattering range by controlling the position of a control means 117. Since the material scattering range in the carrying direction of a base material scattered from the vapor deposition source 113 is proportional to the film thickness of the material vapor-deposited on the base material, the quantity of the material to be vapor-deposited on the base material, and the thickness of the film to be deposited can be controlled thereby. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004225058(A) 申请公布日期 2004.08.12
申请号 JP20020352602 申请日期 2002.12.04
申请人 SONY CORP 发明人 KANO HIROSHI;MORI TAKAO;MORI KEIZO
分类号 H05B33/10;C23C14/24;H01L51/50;H05B33/14;(IPC1-7):C23C14/24 主分类号 H05B33/10
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