SEMICONDUCTOR FABRICATING APPARATUS WITH MAO COATING TO IMPROVE ENDURANCE OF SEMICONDUCTOR FABRICATING APPARATUS AND WAFER FABRICATING EFFICIENCY

摘要

PURPOSE: A semiconductor fabricating apparatus with MAO(micro arc oxidation) coating is provided to improve endurance of a semiconductor fabricating apparatus and wafer fabricating efficiency by forming MAO coating on a chamber, a heater inherent in the chamber and a gas distributing apparatus. CONSTITUTION: A chamber(1) for fabricating a semiconductor is prepared. A heater(2) is made of a metal material to apply a heat source to a wafer placed on the heater, installed in the chamber. A gas injecting apparatus(5) applies physical and chemical pressure to the wafer. A MAO coating(11,25,51) is formed on the chamber, the heater and the gas injecting apparatus by a predetermined thickness.