| 摘要 |
PURPOSE: A method for testing defects of a gray tone mask and a method for fabricating a gray tone mask are provided to prevent the generation of defects of a TFT substrate such as the short between a source and a drain, without decreasing the yield of the gray tone mask production. CONSTITUTION: A method for testing defects of a gray tone mask includes a step of extracting a reject of a mask having black and/or white defect of defect level beyond a predetermined allowance range. In the allowance range, a defect threshold value of the white defect is larger than that of the black defect. A gray tone part(13) is an area formed with a shield pattern(13a) below an exposure threshold value of light when using the gray tone mask. The gray tone part is a pattern corresponding to a channel part of a TFT substrate.
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