| 摘要 |
PROBLEM TO BE SOLVED: To suppress the residue of particles in the outer peripheral section of a substrate and, at the same time, the collapse of a resist pattern in cleaning and drying the substrate by rotating the substrate. SOLUTION: In cleaning and drying a substrate 100 to be treated by rotating the substrate 100, the rotating speedω<SB>dr</SB>of the substrate 100 is reduced in accordance with the radius r of a dried area, by increasing the supplied amount of a rinsing solution to the substrate 100 as going toward the outer peripheral section of the substrate 100 from the central part of the substrate 100, while a rinsing nozzle 103 is moved toward the outer periphery from the center of the substrate 100. COPYRIGHT: (C)2005,JPO&NCIPI |
