发明名称 |
SYSTEM FOR REFINING HIGHLY CONCENTRATED PHOSPHORIC ACID USING WASTE LIQUID FROM ETCHING PROCESS AND METHOD FOR REFINING THEREOF |
摘要 |
PURPOSE: To provide a system for refining highly concentrated phosphoric acid from waste liquid from a manufacturing process of semiconductor or liquid crystalline display device and a method for refining thereof. CONSTITUTION: The system using waste liquid from etching process including 50-70 wt.% of phosphoric acid, 10-30 wt.% of acetic acid, 5-10 wt.% of nitric acid and the remaining amount of water comprises a waste liquid storage part (101) which stores the waste liquid from etching process, a vacuum concentration reaction part (102) which condenses the waste liquid at the temperature of 90-118 deg.C under pressure of 300-700 mmHg to separate a lower layer of a highly concentrated phosphoric acid solution from an upper layer of a side product and a phosphoric acid solution storage part (105) which extracts the highly concentrated phosphoric acid solution from the vacuum concentration reaction part and then stores it. |
申请公布号 |
KR100461849(B1) |
申请公布日期 |
2004.12.06 |
申请号 |
KR20040023986 |
申请日期 |
2004.04.08 |
申请人 |
KWANGJIN CHEMICAL CO., LTD. |
发明人 |
KANG, KYUNG HEE;KIM, SUNG HWA;KWON, KEUN SUB |
分类号 |
C01B25/234 |
主分类号 |
C01B25/234 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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