POSITIVE TYPE RESIST COMPOSITION COMPRISING RESIN COMPRISING HYDROXYSTYRENE-DERIVED UNIT AND ALCOHOLIC HYDROXYL GROUP-CONTAINING (METH)ACRYLATE UNIT, ACID GENERATOR AND POLYPROPYLENE GLYCOL, AND FORMATION METHOD OF RESIST PATTERN USING THE COMPOSITION

摘要

PURPOSE: A positive type resist composition and a method for forming a resist pattern by using the composition are provided, to obtain a high resolution and a wide depth of focus and to reduce the generation of scum or development defect. CONSTITUTION: The positive type resist composition comprises a resin which comprises a copolymer comprising a first unit derived from hydroxystyrene and a second unit derived from a (meth)acrylate having an alcoholic hydroxyl group and having a mass average molecular weight of 2,000-8,500 (wherein 10-25 mol% of the hydroxyl group of the first unit and the alcoholic hydroxyl group of the second unit is protected with an acid-labile dissolution inhibitor group), and whose solubility in alkali increases by the action of an acid; an acid generator which generates an acid by the exposure to light; and polypropylene glycol.