发明名称 METHOD FOR FABRICATING BAND PASS FILTER HAVING HIGH RESOLUTION AND ACCURATE FIN PATTERNS
摘要 PURPOSE: A method for fabricating band pass filter is provided to obtain high resolution and accurate fine patterns by using photosensitive Ag paste to forming a conductive layer. CONSTITUTION: A filter layer(21) is formed on an upper surface of a substrate. An exposure process is performed to expose a part of the filter layer. A development process is performed to form a filter pattern by developing the exposed part of the filter layer and removing an unexposed part of the filter layer from the filter layer. A firing process for the filter layer having the filter pattern is performed. The filter pattern includes one or more unit cells having a cuneal opening.
申请公布号 KR20050000182(A) 申请公布日期 2005.01.03
申请号 KR20030040777 申请日期 2003.06.23
申请人 KOREA ELECTRONICS TECHNOLOGY INSTITUTE 发明人 LEE, YOUNG SHIN;PARK, JONG CHUL;PARK, SEONG DAE;SONG, HEE SEOK
分类号 H03H9/46 主分类号 H03H9/46
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