SUBSTRATE TREATMENT EQUIPMENT AND SUBSTRATE TREATMENT METHOD

摘要

PROBLEM TO BE SOLVED: To provide substrate treatment equipment wherein development reaction product or the like on a substrate can be removed more completely. SOLUTION: After predetermined time progresses from forming liquid peak of developer on the substrate W, rinse liquid is spouted on the substrate W while moving a rinse liquid supply nozzle 40 to a predetermined forward scanning direction La so that it may pass through an upper part of the substrate W, and development reaction on the substrate W is stopped. After the rinse liquid supply nozzle 40 moves to the forward scanning direction La, inversion movement of the rinse liquid supply nozzle 40 is performed backwardly to the forward scanning direction La while continuing spouting of the rinse liquid, and the rinse liquid is supplied again to a region of a move finished edge side in the substrate W. COPYRIGHT: (C)2005,JPO&NCIPI