PLASMA PROCESSING APPARATUS AND TREATMENT ROOM INTERNAL SURFACE STABILIZATION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a treatment room internal surface stabilization method which removes a deposition film in a treatment room and suppress corrosion of a wall surface in a plasma etch processing apparatus. SOLUTION: In the treatment room internal surface stabilization method of the plasma processing apparatus which generates plasma by introducing raw gas in a treatment room in which a processed object is installed, and the processed object is processed after a cleaning treatment (step S2) following an etching treatment (step S1). A treatment room internal surface stabilization treatment (step S3) is performed wherein O2gas or F gas as an internal surface protective gas for protecting the treatment room internal surface is introduced and plasma treatment is performed. Consequently, the treatment room surface of a wall is stabilized, and material constituting the treatment room wall surface is prevented from being discharged in the treatment room at the time of etching treatment. COPYRIGHT: (C)2005,JPO&NCIPI