发明名称 METHOD FOR MANUFACTURING SILICON CURVED SURFACE BODY, SILICON CURVED SURFACE BODY, DEVICE, AND METHOD FOR MANUFACTURING THE DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing silicon curved surface bodies used as a material of a curved surface semiconductor or the like, in a simple process and at a low cost, and to provide the silicon curved surface bodies having excellent performance, a device equipped with the silicon curved surface bodies, and a method for manufacturing the device. SOLUTION: The method for manufacturing the silicon curved surface bodies, characterized by using a liquid material containing a silane compound, is provided. The silicon curved surface bodies formed by the method for manufacturing the silicon curved surface bodies and the device using, as a material, the silicon curved surface bodies are provided. Further, the method for manufacturing the device, characterized by using the method for manufacturing the silicon curved surface bodies, is provided. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005089239(A) 申请公布日期 2005.04.07
申请号 JP20030324714 申请日期 2003.09.17
申请人 SEIKO EPSON CORP 发明人 AOKI TAKASHI;FURUSAWA MASAHIRO
分类号 C30B29/06;H01L21/208;H01L21/336;H01L29/06;H01L29/786;(IPC1-7):C30B29/06 主分类号 C30B29/06
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