| 发明名称 |
Film forming composition, process for producing film forming composition, insulating film forming material, process for forming film, and silica-based film |
| 摘要 |
A process for producing a film forming composition, the process including hydrolyzing and condensing: (A) at least one silane compound selected from a compound (A-1) shown by the following general formula (1), a compound (A-2) shown by the following general formula (2), and a compound (A-3) shown by the following general formula (3), <?in-line-formulae description="In-line Formulae" end="lead"?>R<SUB>a</SUB>Si(OR<SUP>1</SUP>)<SUB>4-a</SUB> (1) <?in-line-formulae description="In-line Formulae" end="tail"?> <?in-line-formulae description="In-line Formulae" end="lead"?>Si(OR<SUP>2</SUP>)<SUB>4</SUB> (2) <?in-line-formulae description="In-line Formulae" end="tail"?> <?in-line-formulae description="In-line Formulae" end="lead"?>R<SUP>3</SUP><SUB>b</SUB>(R<SUP>4</SUP>O)<SUB>3-b</SUB>Si-(R<SUP>7</SUP>)<SUB>d</SUB>-Si(OR<SUP>5</SUP>)<SUB>3-c</SUB>R<SUP>6</SUP><SUB>c</SUB> (3); and <?in-line-formulae description="In-line Formulae" end="tail"?> (B) a cyclic silane compound shown by the following general formula (4):
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| 申请公布号 |
US2005096415(A1) |
申请公布日期 |
2005.05.05 |
| 申请号 |
US20040947253 |
申请日期 |
2004.09.23 |
| 申请人 |
JSR CORPORATION |
发明人 |
AKIYAMA MASAHRIO;HATTORI SEITARO;OBI MASAKI;HASEGAWA KOICHI |
| 分类号 |
C09D183/04;C09D183/14;H01L21/312;H01L21/316;(IPC1-7):C08L1/00 |
主分类号 |
C09D183/04 |
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