MASK FOR USE IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

摘要

The mask has a pattern of opaque structures applied on a support (28), where the opaque structures comprise coarser large-area structures and finer bar-like structures (32c). Transparent intermediate spaces (36, 36`) remaining between the bar-like structures (32c) are filled with a liquid or solid dielectric material (38, 38`). The opaque structures consist of an electrically conductive material. Independent claims are also included for the following: (A) a microlithographic projection exposure apparatus for the production of microstructured components (B) a method for the microlithographic production of a microstructured component (C) a method for producing a mask for use in a microlithographic projection exposure apparatus.