| 摘要 |
PROBLEM TO BE SOLVED: To provide a measuring method of a fine pattern line width and its system. SOLUTION: The measuring method fine pattern line determines whether an examination object pattern is acceptable or not, by comparing a scanning electron microscope image of a prepared reference pattern, and a secondary electron signal profile corresponding thereto with a scanning electron microscope image of a corresponding examination object pattern and secondary signal profile corresponding thereto (stages S809, S813), and measures line widths of the examination object patterns determined to be not defect patterns (stages S811, S815). In the comparison results of the microscope images, if it is determined that the examination object patterns are not acceptable, the method compares the profiles to finally determine whether the patterns are acceptable or not. COPYRIGHT: (C)2005,JPO&NCIPI |
