| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive polymer having a low halogen content and exhibiting a low crosslinking density when cured. SOLUTION: This polymer is expressed by chemical formula (1) (R<SP>1</SP>to R<SP>4</SP>are each an alkyl, an aryl, arylalkyl or an alkylaryl; X<SP>1</SP>to X<SP>4</SP>are each a halogen; UE is an unsaturated ester; SE is a saturated ester; RX is a number of total haloalkyl groups; x is 0 or 1; n in an integer expressing a number of repeating monomer units; and a', b', c', d', e, f, g, h, i, j, k and m are each 0 to 4, provided that at least one of e to h is 1 or more in at least some of monomers, at least one of i, j, k and m is 1 or more in at least some of monomers, and a' to d', e to k and m satisfy inequalities as follows: a'+e+i≤4; b'+f+j≤4; c'+g+k≤4; and d'+h+m≤4) or the like. COPYRIGHT: (C)2005,JPO&NCIPI |
