发明名称 NONVOLATILE MEMORY ELEMENT AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To reduce an element size and improve reliability in a memory element having a structure where a memory gate and a control gate are adjacent to each other. SOLUTION: The side surface of the memory gate 115 in contact with the control gate 126 is formed by etch back. The side surface is made to be an arcuate bent surface which is protruded on the side thereof in contact with the control gate 126. Consequently, the short circuit between electrodes caused by the emergence of a thin film on an HTO film 118 is suppressed. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005228957(A) 申请公布日期 2005.08.25
申请号 JP20040036871 申请日期 2004.02.13
申请人 NEC ELECTRONICS CORP 发明人 YOSHINO AKIRA
分类号 G11C11/34;H01L21/8247;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L21/824 主分类号 G11C11/34
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