发明名称 METHOD FOR MACHINING WAFER
摘要 PROBLEM TO BE SOLVED: To easily handle even a wafer which is formed thin during machining. SOLUTION: An annular protection member 12 is joined in an outer peripheral excessive area on the surface of the wafer W where no device is formed, and the top surface side is held in this state to grind the reverse surface Wb. The outer periphery is reinforced with the annular protection member 12, so the wafer is easy to handle even after being ground thin. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005294623(A) 申请公布日期 2005.10.20
申请号 JP20040108965 申请日期 2004.04.01
申请人 DISCO ABRASIVE SYST LTD 发明人 ARAI KAZUNAO
分类号 B24B7/22;H01L21/02;H01L21/301;H01L21/304;H01L21/306;H01L21/46;H01L21/58;H01L21/68;H01L21/78;(IPC1-7):H01L21/304 主分类号 B24B7/22
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