发明名称 |
Micromachining process for forming microstructureshaving sloping and/or profiled side walls or subs tructures. |
摘要 |
The object of the present invention is to provide a three-dimensional microfabrication method for photolithographic mass-fabrication of three-dimensional microstructures having arbitrarily sloped and/or profiled sidewalls or substructures. The process comprises: locating photo-curable material in a suitable reservoir; dehydrating the photo-curable material (eg by heating); annealing areas forming the upper boundaries of sloped or profiled sidewalls or substructures; providing one or more metal layers masking the areas of the photo-curable material where said material in the micro structure is not required; photolithographically patterning areas to be deformed using polymeric masks; re-heating the material before mechanically disrupting the surface of areas between or enclosed by the annealed areas to form the required sub-structures whilst the photocurable material is cooling; and selectively photopolymerising the regions required for forming the end microstructures. |
申请公布号 |
HK1068690(A1) |
申请公布日期 |
2005.11.18 |
申请号 |
HK20050101009 |
申请日期 |
2001.01.01 |
申请人 |
LIU WAI YIP |
发明人 |
WAI YIP LIU |
分类号 |
B81C1/00;G03F7/16;G03F7/20;G03F7/40 |
主分类号 |
B81C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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