SOLVENT COMPOSITION AND METHOD FOR DEVELOPING RESIST

摘要

PROBLEM TO BE SOLVED: To provide an excellent solvent composition without any collapse of a fine resist pattern when being dried after removing a rinsing agent. SOLUTION: The method includes: a step of applying and exposing a photoresist on the surface of a wafer; a developing step to develop the exposed resist with a developing solution; a first rinsing step of clean and remove the developing solution by using a water-based rinsing agent; and a second rinsing step to remove the water-based rinsing agent by using a solvent composition containing a fluorine-containing compound solvent and a fluorine-based surfactant, and a drying step to remove the solvent composition. COPYRIGHT: (C)2006,JPO&NCIPI