| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition method and a film formation device where a thin film can be formed at high efficiency by reducing the time for forming the tin film. SOLUTION: In the method for producing a thin film comprising: a film formation process where film formation particles generated from a film formation source are deposited on a substrate arranged in a vacuum vessel to form a thin film; and a shielding process where a part of the space between the film formation source and the substrate is shielded using a shielding means having an opening part, the shielding process includes an opening part moving stage where the opening part is moved relatively to the substrate under the film formation process, and the shape of the opening part is the one based on at least either the formation rate distribution of the thin film in the surface of the substrate in the film formation process or the desired film thickness distribution of the thin film formed on the substrate. COPYRIGHT: (C)2006,JPO&NCIPI |
