发明名称 EVALUATION METHOD OF SUBSTRATE SURFACE
摘要 PROBLEM TO BE SOLVED: To provide an evaluation method of a substrate surface capable of detecting a delicate change on the silicon substrate surface by ATR-FTIR measurement. SOLUTION: In absorption spectrum acquired from the substrate surface, an absorption peak specified by a specific absorption wavenumber is determined as a standard peak, and an absorption peak specified by another specific absorption wavenumber is determined as a reference peak. Detection of a delicate change of the chemical bonding state on the substrate surface or quantitative evaluation becomes possible by taking the peak intensity ratio between the standard peak and the reference peak. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006003285(A) 申请公布日期 2006.01.05
申请号 JP20040181962 申请日期 2004.06.21
申请人 RENESAS TECHNOLOGY CORP 发明人 HAMANO MEGUMI;SAEKI TOMONORI;NAGAO DAISUKE
分类号 G01N21/27;H01L21/66 主分类号 G01N21/27
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