发明名称 ELECTRON BEAM DRAWING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an electron beam drawing method for improving the quality of electron beam drawing. SOLUTION: The position of a starting point of electron beams parallel to each other is swung in a predetermined scanning direction, so that, for example, when an irregular distance is produced in a fifth count, the position where an irregular distance is caused is unevenly shifted in the predetermined scanning direction and this improves the quality of electron beam drawing. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006053311(A) 申请公布日期 2006.02.23
申请号 JP20040234402 申请日期 2004.08.11
申请人 KONICA MINOLTA HOLDINGS INC 发明人 MASUDA OSAMU;IMAE MAKIKO;HORII YASUSHI;FURUTA KAZUMI
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
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