| 摘要 |
PROBLEM TO BE SOLVED: To provide a technique capable of maintaining a final surface of a projection optical system, in an immersed state, or in a new and useful for generating the immersion state, in an exposure apparatus that uses immersion method. SOLUTION: An exposure apparatus exposes a substrate 9 via an original plate, with a gap in between the substrate and a final surface of a projection optical system being filled with liquid. The exposure apparatus comprises a substrate stage 10 that moves, with the substrate held thereby; a flat plate 21 that moves, having substantially the same height as that of the substrate 9 held by the substrate stage 10; a supply means, having a supplying nozzle 5 and arranged facing the final surface, for supplying liquid through the supplying nozzle 5 into a gap between at least one of the flat plate 21 and the substrate 9 held by the substrate stage 10, and the final surface; and a recovering means having a recovering nozzle 6, for recovering the liquid filled in the gap via the recovering nozzle 6. COPYRIGHT: (C)2006,JPO&NCIPI |
