发明名称 |
DONOR SUBSTRATE FOR LASER INDUCED THERMAL IMAGING AND METHOD OF FABRICATING THEREOF, AND METHOD OF FABRICATING OLED USING THE SAME |
摘要 |
A donor substrate for LITI(Laser Induced Thermal Imaging), a manufacturing method thereof, and a method for forming an OLED(Organic Light Emitting Display) by using the donor substrate are provided to improve a transfer property of an organic film by adding a welding layer on a transfer layer of the donor substrate. A donor substrate for LITI includes a base substrate(201), a photothermal conversion layer(202), and a transfer layer(203). The transfer layer includes an organic layer(203a) and a welding layer(203b). The organic layer is formed on the photothermal conversion layer and includes an organic light emitting layer. The welding layer is arranged on the organic layer and contains a material having a glass transition material between 200 and 100°C. |
申请公布号 |
KR100770271(B1) |
申请公布日期 |
2007.10.26 |
申请号 |
KR20060062685 |
申请日期 |
2006.07.04 |
申请人 |
SAMSUNG SDI CO., LTD. |
发明人 |
KWON, YOUNG GIL;LEE, JAE HO;LEE, SUN HEE;YANG, NAM CHOUL |
分类号 |
H05B33/02;H05B33/14 |
主分类号 |
H05B33/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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