发明名称 DONOR SUBSTRATE FOR LASER INDUCED THERMAL IMAGING AND METHOD OF FABRICATING THEREOF, AND METHOD OF FABRICATING OLED USING THE SAME
摘要 A donor substrate for LITI(Laser Induced Thermal Imaging), a manufacturing method thereof, and a method for forming an OLED(Organic Light Emitting Display) by using the donor substrate are provided to improve a transfer property of an organic film by adding a welding layer on a transfer layer of the donor substrate. A donor substrate for LITI includes a base substrate(201), a photothermal conversion layer(202), and a transfer layer(203). The transfer layer includes an organic layer(203a) and a welding layer(203b). The organic layer is formed on the photothermal conversion layer and includes an organic light emitting layer. The welding layer is arranged on the organic layer and contains a material having a glass transition material between 200 and 100°C.
申请公布号 KR100770271(B1) 申请公布日期 2007.10.26
申请号 KR20060062685 申请日期 2006.07.04
申请人 SAMSUNG SDI CO., LTD. 发明人 KWON, YOUNG GIL;LEE, JAE HO;LEE, SUN HEE;YANG, NAM CHOUL
分类号 H05B33/02;H05B33/14 主分类号 H05B33/02
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