发明名称 THIN-FILM THERMISTOR AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To improve quality and reliability by preventing joint defects of an electrode while suppressing a change in resistance under a high temperature environment. SOLUTION: A thin-film thermistor comprises: a silicon substrate 3, where an SiO<SB>2</SB>layer 2 is formed on the surface; a thermistor thin film 4 of which the pattern is formed on the upper surface of the SiO<SB>2</SB>layer 2; a junction layer 5 formed of a metal material except a rare metal, where the pattern of the junction layer 5 is formed on the upper surface of the SiO<SB>2</SB>layer 2; and the electrode 6 made of a rare metal, where the pattern of the electrode 6 is formed on the junction layer 5. Inside the thermistor thin film 4, there is a thin-film non-formation region 4a, where the thermistor thin film 4 is not formed. The junction layer 5 and the electrode 6 are buried in the thin-film non-formation region 4a and the side is joined to the inner surface of the thermistor thin film 4. One portion of the junction layer 5 and the electrode 6 in the thin-film non-formation region 4a is removed to adjust the value of resistance. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008258387(A) 申请公布日期 2008.10.23
申请号 JP20070098781 申请日期 2007.04.04
申请人 MITSUBISHI MATERIALS CORP 发明人 INABA HITOSHI;NAGATOMO KENSHO;ADACHI YOSHINORI
分类号 H01C7/04 主分类号 H01C7/04
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